Plasma Assisted Chemical Vapor Deposition - PACVD
In the PACVD process, a chemical reaction takes place in the plasma reactor that results in the formation of coating on the components. The vapors and prerequisite gases for reaction are introduced into a reactor, are activated by the energy generated by the plasma, and react together. By PACVD system, it is possible to form titanium-based coatings (TiN, TiCN, TiAIN, TiC) as well as DLC (diamond-like carbon) coating. In order to improve the created coatings, the components are usually subjected to a plasma nitriding process prior to the PACVD process (both processes are performed in the same furnace).
Plasmapazhouh Pars Co., with a PACVD system with dimensions of 40 * 60, has the ability to provide services and conduct research in this field. Currently, the company focuses on the development of DLC coatings regarding the use of the PACVD system.