PACVD (Plasma Assisted Chemical Vapor Deposition) coating system
Plasmapazhouh Pars Co. has the ability to manufacture PACVD (Plasma Assisted Chemical Vapor Deposition) coating system. By the PACVD system, it is possible to form titanium base coatings (TiN, TiCN, TiAlN, TiC) as well as DLC (diamond-like carbon) coatings. Due to the structural similarities of the PACVD system and the plasma nitroiding system, it is possible to use the PACVD device for plasma nitriding by considering measures such as installing two vacuum chambers in the system. It is worth noting that in order to improve the created coatings, the components are usually subjected to a plasma nitriding process prior to the PACVD process (both processes are performed in the same furnace). The standard size of PACVD made by Plasmapazhou Pars Co. is 40cm in diameter and 60cm in height; However, depending on the customer’s needs, it is possible to build a PACVD system with other dimensions.